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1

Culinary Diplomacy: Breaking Bread to Win Hearts and Minds

Chapple-Sokol, Sam

Journal:

The Hague Journal of Diplomacy

Year:

2013

Language:

english

File:

PDF, 344 KB

english, 2013

2

Substrate-dependent growth of atmospheric pressure chemically vapor deposited silicon dioxide from dichlorosilane and oxygen

Jonathan D. Chapple-Sokol, Roy G. Gordon

Journal:

Thin Solid Films

Year:

1989

Language:

english

File:

PDF, 746 KB

english, 1989

3

Gas-phase kinetics in the atmospheric pressure chemical vapor deposition of silicon from silane and disilane

Giunta, Carmen J., McCurdy, Richard J., Chapple-Sokol, Jonathan D., Gordon, Roy G.

Journal:

Journal of Applied Physics

Year:

1990

Language:

english

File:

PDF, 1.38 MB

english, 1990

4

Multizone uniformity control of a chemical mechanical polishing process utilizing a pre- and postmeasurement strategy

El Chemali, Chadi, Moyne, James, Khan, Kareemullah, Nadeau, Rock, Smith, Paul, Colt, John, Chapple-Sokol, Jonathan, Parikh, Tarun

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2000

Language:

english

File:

PDF, 995 KB

english, 2000

5

[IEEE 2008 15th International Symposium on the Physical and Failure Analysis of Integrated Circuits - singapore (2008.07.7-2008.07.11)] 2008 15th International Symposium on the Physical and Failure Analysis of Integrated Circuits - Etching of copper in deionized water rinse

Gambino, J., Robbins, J., Rutkowski, T., Johnson, C., DeVries, K., Rath, D., Vereecken, P., Walton, E., Porth, B., Wenner, M, McDevitt, T., Chapple-Sokol, J., Luce, S.

Year:

2008

Language:

english

File:

PDF, 1.25 MB

english, 2008

6

Kinetics of Silicon Oxide Thin Film Deposition From Silane and Disilane with Nitrous Oxide.

Chapple-Sokol, Jonathan D., Giunta, Carmen J., Gordon, Roy G.

Journal:

MRS Proceedings

Year:

1987

Language:

english

File:

PDF, 324 KB

english, 1987

7

ChemInform Abstract: A Kinetics Study of the Atmospheric Pressure CVD Reaction of Silane and Nitrous Oxide

CHAPPLE-SOKOL, J. D., GIUNTA, C. J., GORDON, R. G.

Journal:

Year:

1990

File:

PDF, 138 KB

1990

8

Review: Table Talk: Building Democracy One Meal at a Time , by Janet Flammang

Chapple-Sokol, Sam

Journal:

Gastronomica The Journal of Food and Culture

Year:

2017

Language:

english

File:

PDF, 52 KB

english, 2017

9

The etched multiple vertical junction silicon photovoltaic cell

J. Goodrich, J. Chapple-Sokol, G. Allendorf, R. Frank

Journal:

Year:

1982

Language:

english

File:

PDF, 743 KB

english, 1982

10

Polarization Effects of Fluorine on the Relative Permittivity in Polyimides

Hougham, G., Tesoro, G., Viehbeck, A., Chapple-Sokol, J. D.

Journal:

Year:

1994

Language:

english

File:

PDF, 931 KB

english, 1994

11

[IEEE 2014 IEEE International Reliability Physics Symposium (IRPS) - Waikoloa, HI, USA (2014.6.1-2014.6.5)] 2014 IEEE International Reliability Physics Symposium - Stress migration in a copper - Aluminum hybrid technology

Christiansen, Cathryn, Chapple-Sokol, Jonathan, Coster, Michael, Hunt, Douglas, Lee, Tom C., Murphy, William, Gambino, Jeffrey, Cooney, Edward, Kemerer, Timothy, Rassel, Richard, Stamper, Tony, U'Ren,

Year:

2014

Language:

english

File:

PDF, 698 KB

english, 2014

12

Hydrogen incorporation in silicon nitride films deposited by remote electron-cyclotron-resonance chemical vapor deposition

Kotecki, David E., Chapple-Sokol, Jonathan D.

Journal:

Journal of Applied Physics

Year:

1995

Language:

english

File:

PDF, 1.40 MB

english, 1995

13

E’ centers and nitrogen-related defects in SiO2 films

Stathis, J. H., Chapple-Sokol, J., Tierney, E., Batey, J.

Journal:

Applied Physics Letters

Year:

1990

Language:

english

File:

PDF, 552 KB

english, 1990

14

Using a Barrier Layer to Inhibit Ti/Oxide Reaction to Reduce RC Delay and Improve Electromigration in Al-Cu/Ti/W Interconnect for High Power Analog and Mixed Signal Applications

Murphy, William, Lee, Tom C, Chapple-Sokol, Jonathan, Delibac, Daniel A, He, Z. X., Luce, Stephen E, Mongeon, Stephen A, Thomas, David C, Vanslette, Daniel S, Sullivan, Timothy D

Journal:

MRS Proceedings

Year:

2008

Language:

english

File:

PDF, 404 KB

english, 2008

15

A Kinetics Study of the Atmospheric Pressure CVD Reaction of Silane and Nitrous Oxide

Chapple-Sokol, Jonathan D.

Journal:

Journal of The Electrochemical Society

Year:

1989

Language:

english

File:

PDF, 1.25 MB

english, 1989

16

Energy Considerations in the Deposition of High-Quality Plasma-Enhanced CVD Silicon Dioxide

Chapple-Sokol, J. D.

Journal:

Journal of The Electrochemical Society

Year:

1991

Language:

english

File:

PDF, 523 KB

english, 1991

17

RF Power Dependence of the Material Properties of PECVD Silicon Dioxide

Chapple-Sokol, J. D., Tiemey, E., Batey, J.

Journal:

MRS Proceedings

Year:

1989

Language:

english

File:

PDF, 309 KB

english, 1989

18

[IEEE Twenty Fourth IEEE/CPMT International Electronics Manufacturing Technology Symposium - Austin, TX, USA (18-19 Oct. 1999)] Twenty Fourth IEEE/CPMT International Electronics Manufacturing Technology Symposium (Cat. No.99CH36330) - Yield improvement at the contact process through run-to-run control

Khan, K., El Chemali, C., Moyne, J., Chapple-Sokol, J., Nadeau, R., Smith, P., Colt, J., Parikh, T.

Year:

1999

Language:

english

File:

PDF, 597 KB

english, 1999